PPT Slide
NEW VEECO SEMICONDUCTOR OPPORTUNITY:
ADVANCED PHOTOMASK DEPOSITION SYSTEMS
- Device Feature shrinks require use of deep UV and EUV lithography (13.4 nm)…and enhanced masks
- Phase-shift and EUV photomasks require IBD control of film purity and film thickness
- Veeco has shipped first (4) systems to leading photomask manufacturers (ASP $3-5M)
- ’03/’04 growth opportunity…$20M to $30M