Photolithography Light Source SystemsOur light source systems are comprised of the most advanced ArF immersion light sources for use on the most critical process layers. Cymer’s excimer light sources, which comprise an installed base of approximately 3,300 systems, are based on ArF and KrF technology that deliver 193 and 248nm light, respectively. The extremely short wavelengths and highly narrowed bandwidths of our light sources work in concert with our lithography customers’ steppers and scanners and their sophisticated lens systems to help enable the very fine feature resolution required for patterning today’s most advanced circuitry.
 ArF Immersion Light Sources |
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