Millipore 1998 Annual Report

M i c r o e l e c t r o n i c s R e v i e w
C o n t e n t s		Previous \| Next

Millipore’s Microelectronics business segment includes products and services provided to semiconductor fabrication companies as well as OEM suppliers to those companies.
– Applications: Millipore products are used for contamination control of fluids used in manufacturing advanced semiconductor devices. These fluids include gases, chemicals, acids, water, and photoresists. Millipore products are also used to control the flow and pressure of gases used in semiconductor manufacturing.

– Revenue growth 1997 to 1998: (32)%.

– Revenue growth 1997 to 1998, local currency: (28)%.

N e w P r o d u c t s

1 2 3 4

1

Wafergard® III NF-750 High Capacity Gas Filter for filtration in high flow, high temperature processing environments.

2

Waferpure® Carbon Monoxide (CO) Micro and Mini XL Integrated Filter/Purifiers for protecting wafers and processing equipment from contamination in carbon monoxide applications.

3

Span™ Low Profile Gas Cylinder Scales for easier installation in gas cabinets.

4

Millipore Chem-Line™ II Filters with special fittings for 300mm tools in point-of-use wet station chemical applications.

5 6 7 8

5

Pumpgard™ Prefilters that protect downstream chemical pumps against damage from broken wafer pieces.

6

Planargard™ Disposable Filters for filtration of oxide and metal CMP slurries.

7

Impact™ Low Hold-Up Volume Disposable (LHVD) Filter that minimizes wetting time, limits waste of expensive photochemical fluids, and prevents microbubble formation.

8

Impact Stand Alone Manifold for cleaner changeout of photochemical filters in a fraction of the time.

9 10 11

9

Optimizer™ DEV and DI filters for point-of-use filtration of positive developer and DI water applications in photolithography.

10

Encompass™ Controller for point-of-use dispense of high viscosity fluids.

11

QuickChange® Filter designs for 200mm and 300mm tools, which incorporate non-dewetting Teflon® polymers for improved equipment efficiency.


1	2	3	4
1
Wafergard® III NF-750 High Capacity Gas Filter for filtration in high flow, high temperature processing environments.
2
Waferpure® Carbon Monoxide (CO) Micro and Mini XL Integrated Filter/Purifiers for protecting wafers and processing equipment from contamination in carbon monoxide applications.
3
Span™ Low Profile Gas Cylinder Scales for easier installation in gas cabinets.
4
Millipore Chem-Line™ II Filters with special fittings for 300mm tools in point-of-use wet station chemical applications.


5	6	7	8
5
Pumpgard™ Prefilters that protect downstream chemical pumps against damage from broken wafer pieces.
6
Planargard™ Disposable Filters for filtration of oxide and metal CMP slurries.
7
Impact™ Low Hold-Up Volume Disposable (LHVD) Filter that minimizes wetting time, limits waste of expensive photochemical fluids, and prevents microbubble formation.
8
Impact Stand Alone Manifold for cleaner changeout of photochemical filters in a fraction of the time.


9	10	11
9
Optimizer™ DEV and DI filters for point-of-use filtration of positive developer and DI water applications in photolithography.
10
Encompass™ Controller for point-of-use dispense of high viscosity fluids.
11
QuickChange® Filter designs for 200mm and 300mm tools, which incorporate non-dewetting Teflon® polymers for improved equipment efficiency.